The unrivalled thinness of our CNMs has significant advantages against traditional products when being used as support film for TEM grids. In transmission electron microscopy, the electron beam has to pass not only through the sample but also through the underlying carrier layer. The thicker this layer is in comparison to the dimensions of the sample, the poorer the quality of the TEM signal gets and the sharpness of the "picture" gets lost.
To examine samples in the scale of below 10 nm, TEM grids covered with our ultrathin CNM (thickness of 1-3 nm) show significantly better results.